Ines Zucker

Ines Zucker's picture

Ph.D. Materials Science and Engineering, Tel Aviv University, 2016

M.Sc. Materials and Nanotechnologies Engineering, Tel Aviv University, 2011

B.Sc. Mechanical Engineering, Tel Aviv University, 2010


Download Resumé                Google Scholar Profile

Ines joined the Elimelech research group as a postdoctoral research associate in the Department of Chemical and Environmental Engineering at Yale University on Fall 2016. Her research focuses on nanotechnology-enabled environmental applications and processes.

Ines received her degrees from Tel-Aviv University, Israel. She holds a B.Sc. in Mechanical Engineering and M.Sc. in Materials Engineering and Nanotechnologies, both cum laude. During her Ph.D. in Environmental Engineering, Ines studied the elimination of trace organic compounds (such as pharmaceutical residues) in wastewater effluent via multi-stage ozonation pilot followed by soil aquifer treatment. Given the emerging interest in environmental applications of nanomaterials worldwide, Ines plans on developing an interdisciplinary expertise on the border between materials and environmental engineering.

During her academic career, Ines received several prestigious awards, honors and scholarships including the Israeli Water Authority Ph.D. scholarship, Ministry of Science, Technology and Space award for exceptional female doctoral students in science, and Rieger Fellowship for environmental studies. She was also awarded the prestigious YIBS (Yale Institute for Biospheric Studies) post-doctoral fellowship, in addition to the Presidential post-doctoral scholarship from Tel Aviv University. 

Ines will continue her research as a faculty at the Faculty of Engineering and Porter School of Environmental Studies at Tel Aviv University (joint appointment) in 2019.

Publications

pdfs and supporting information for group publications available on the main publications page.

  1. I. Zucker, A. Riani, I. Gozlan, D. Avisar, H. Mamane; Formation and degradation of n-oxide venlafaxine during ozonation and post-biological treatment, Science of the Total Environment, 619 (2018) 578-586.

  2. X. Lu, X. Feng, J.R. Werber, C. Chu, I. Zucker, J. Kim, C. Osuji, M. Elimelech; Enhanced antimicrobial activity through the controlled alignment of graphene nanosheets, PNAS, 114 (2017) E9793–E9801.

  3. I. Zucker, J.R. Werber, Z.S. Fishman, S.M. Hashmi, U.R. Gabinet, X. Lu, C.O. Osuji, L.D. Pfefferle, M. Elimelech; Loss of phospholipid membrane integrity induced by two-dimensional nanomaterials, Environmental Science & Technology Letters, 4 (2017), 404–409.

  4. A. Lakretz, H. Mamane, H. Cikurel, D. Avisar, E. Gelman, I. Zucker; The role of soil aquifer treatment (sat) for effective removal of organic matter, trace organic compounds and microorganisms from secondary effluents pre-treated by ozone, Ozone: Science & Engineering, 10 (2017) 1-10.

  5. I. Zucker, H. Mamane, D. Avisar, M. Jekel, U. Hübner; Determination of oxidant exposure to predict contaminant removal – Water Research, 10 (2016) 508-516.

  6. I. Zucker, H. Mamane, H. Cikurel, M. Jekel, U. Hübner, D. Avisar; A hybrid process of advanced oxidation and short aquifer treatment for water reuse – Water Research, 84 (2015) 315-322.

  7. I. Zucker, Y. Lester, D. Avisar, Y. Weinberger, U. Hübner, M. Jekel, H. Mamane; Influence of wastewater particles on ozone degradation of trace organic contaminants – Environmental Science & Technology, 49 (2015) 301-308.

  8. U. Hübner, I. Zucker, and M. Jekel; Options and limitations of hydrogen peroxide addition to enhance radical formation during ozonation of secondary effluents – Journal of Water Reuse and Desalination, 5 (2015) 8-16.

  9. Y. Lester, H. Mamane, I. Zucker, D. Avisar; Treating wastewater from a pharmaceutical formulation facility by biological process and ozone – Water Research, 47 (2013) 4349-4356.

  10. E. Çetinörgü-Goldenberg, L. Burstein, I. Chayun-Zucker, R. Avni, R.L Boxman; The effect of nitrogen partial pressure and substrate temperature on the characteristics of filtered vacuum arc deposited N:TiO2 thin films – Thin Solid Films, 537 (2013) 28-35.